BIOtech Japan 2016

Booth# 3-35

This year at BIOtech Japan 2016 NTT-AT will showcase 'Nanoimprint Mold','SiC membrane, SiN membrane','Pressure/Vacuum Compact Clean Oven PCO-083TA','Basic process services', etc. We look forward to seeing you in BIOtech Japan 2016. Please stop by our booth.

About BIOtech Japan 2016

Date	May 11-13, 2016
Location	Tokyo Big Sight, Japan
Organizar	Reed Exhibitions Japan Ltd
Website	http://www.bio-t.jp/en/Home/
Admission	Free(Requires pre-registration.)

Details

article on exhibition	Nanoimprint Mold NTT-AT can accommodate a range of needs for Nanoprint Molds, from a fine 20nm pattern for next generation lithography to the order of X μm for bio-MEMS. SiC membrane, SiN membrane The standard sample holder for X-ray analysis and electron beam analysis. Pressure/Vacuum Compact Clean Oven PCO-083TA Pressure-and-heat treatment for removing bubbles in seal or adhesion resins. Basic process services Total process suitable for small-scale production of key devices.

article on exhibition

Nanoimprint Mold
NTT-AT can accommodate a range of needs for Nanoprint Molds, from a fine 20nm pattern for next generation lithography to the order of X μm for bio-MEMS.
SiC membrane, SiN membrane
The standard sample holder for X-ray analysis and electron beam analysis.
Pressure/Vacuum Compact Clean Oven PCO-083TA
Pressure-and-heat treatment for removing bubbles in seal or adhesion resins.
Basic process services
Total process suitable for small-scale production of key devices.