nano tech 2017

This year at nano tech Japan 2017 NTT-AT will showcase 'Nanoimprint Mold','SiC membrane, SiN membrane','Compact Supercritical Dryer','Basic process services', etc. We look forward to seeing you in nano tech 2017. Please stop by our booth.

About nano tech 2017

Date	February 15-17, 2017
Location	Tokyo Big Sight, Japan
Organizar	nano tech executive committee
Website	http://www.nanotechexpo.jp/index.html
Admission	JPY3,000 (Admission will be free by pre-registration.)

Details

article on exhibition	Nanoimprint Mold NTT-AT can accommodate a range of needs for Nanoprint Molds, from a fine 20nm pattern for next generation lithography to the order of X μm for bio-MEMS. SiC membrane, SiN membrane The standard sample holder for X-ray analysis and electron beam analysis. Compact Supercritical Dryer A pattern collapses when liquid surrounding the pattern in various fabrication processes dries up. Supercritical drying can prevent the pattern collapse. Basic process services Total process suitable for small-scale production of key devices.

article on exhibition

Nanoimprint Mold
NTT-AT can accommodate a range of needs for Nanoprint Molds, from a fine 20nm pattern for next generation lithography to the order of X μm for bio-MEMS.
SiC membrane, SiN membrane
The standard sample holder for X-ray analysis and electron beam analysis.
Compact Supercritical Dryer
A pattern collapses when liquid surrounding the pattern in various fabrication processes dries up.
Supercritical drying can prevent the pattern collapse.
Basic process services
Total process suitable for small-scale production of key devices.