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nano tech 2017

nano tech 2017


This year at nano tech Japan 2017 NTT-AT will showcase 'Nanoimprint Mold','SiC membrane, SiN membrane','Compact Supercritical Dryer','Basic process services', etc. We look forward to seeing you in nano tech 2017. Please stop by our booth.

About nano tech 2017

Date February 15-17, 2017
Location Tokyo Big Sight, Japan
Organizar nano tech executive committee
Website http://www.nanotechexpo.jp/index.html
Admission JPY3,000 (Admission will be free by pre-registration.)


article on exhibition
  • Nanoimprint Mold
    NTT-AT can accommodate a range of needs for Nanoprint Molds, from a fine 20nm pattern for next generation lithography to the order of X μm for bio-MEMS.
  • SiC membrane, SiN membrane
    The standard sample holder for X-ray analysis and electron beam analysis.
  • Compact Supercritical Dryer
    A pattern collapses when liquid surrounding the pattern in various fabrication processes dries up.
    Supercritical drying can prevent the pattern collapse.
  • Basic process services
    Total process suitable for small-scale production of key devices.

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