NTT-AT can accommodate a range of needs for Nanoprint Molds, from a fine 20nm pattern for next generation lithography to the order of X μm for bio-MEMS.
Benefits
The applications of Nanoimprint technology are accelerating in various fields. NTT-AT provides the required Nanoimprint Molds for various stages in research, development, application, and commercialization.
The fields of application of Nanoimprint Molds are generally categorized into 3 areas: molds for optics, molds for semiconductors and molds for other applications.
Features
1.Mold For Optics
We fabricate the patterns for micro lenses, holograms, moth eyes, and diffraction gratings using the fine processing technology based on a semiconductor process.
Process examples
phere pattern (micro lens)
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Multilevel pattern
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2.Molds For Semiconductor
NTT-AT will support customer's NIL (Nano Imprint Lithography) technology development using a fine pattern NIL, in the order of 20nm, which is expected to be the next generation lithography technology for semiconductors.Quartz mold with highly accurate patterns
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70nm in diameter | Large space above 10μm |
Process examples
SiO2/Si Mold The uniformity of depth doesn't depend on pattern size. |
3.Mold For others
The fine pattern formation technology of Nano Imprint is expected to be applied in various fields.In addition to processes for various materials including quartz and silicon, fine dot patterns, high aspect ratio patterns, and deep etching pattern formation and processing are provided to satisfy customers' demands. Standard patterns (line width 40, 60, 80 and 100nm, with 100nm depth) are also available, to evaluate system and resin characteristics such as transfer printing accuracy and release properties.
Process examples
Ultra fine pattern
36nm pitch dots
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High aspect ratio pattern
Aspect ratio 1.0
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Deep etching pattern
Column pattern with 40μm height
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Catalog
Pattern layout | SEM image |
【Specification】
Substrate | |
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Material | Quartz |
Size | 10mm square |
thickness | 1mm |
Pattern | |
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atterned area | 7mm square |
Type | L&S (Patterned area: concave/Edge: convex) |
Line width | 45 , 60 , 80 , 100nm |
Duty ratio | 1:1 , 1:5 |
Depth | 100nm |
Past record
NTT-AT has supplied a Nanoimprint Mold for more than 20 years, applying semiconductor fine process technology.
We have sold this product to enterprises, universities and research institutes in various fields, such as next generation lithography, optical fibers, biotechnology and medical applications.
Papers &Publications