EUV half mirrors, only from NTT-AT
Only by using an NTT-AT EUV half mirror, also known as a EUV multilayer beam splitter, can an interferometer for the extreme ultraviolet region be configured, operating in a similar way to those for the visible region and the normal UV region. This free-standing Mo/Si multilayer is applied to various applications in the EUV field such as EUV/X-ray microscopes, EUV/X-ray astronomical telescopes, EUV pump-probe experiments and EUV beam monitor systems.
The proprietary technologies of free-standing thin-film formation, derived from semiconductor process technology, and EUV multilayer formation, derived from optical coating technology, have enabled NTT-AT to develop and sell the EUV half mirror.
Holder diameter: 25.4mm
Half mirror area: 10mm x 10mm
Incident angle: between 0 degrees and 45 degrees
Center wavelength: 13.5nm and 13.9 nm
(Customization is available upon request.)
Past recordsThe EUV half mirror is manufactured and sold in the world only by NTT-AT, and it is utilized in science and industrial applications. This new optical component has been introduced in several published articles shown in the article list.
- Maki Kishimoto, Kazumichi Namikawa, Kouta Sukegawa, Hiroshi Yamatani, Noboru Hasegawa and Momoko Tanaka “Intensity correlation measurement system by picosecond single shot soft x-ray laser,” Rev. Sci. Instrum. 81, 013905 (2010); http://dx.doi.org/10.1063/1.3280173
Publication list (including co-authored papers):
- H. Takenaka, S. Ichimaru, T. Haga, T. Ohchi, H. Ito, Y. Muramatsu, E.M. Gullikson and R.C.C. Perera, “Fabrication of soft X-ray beam splitters for use in the wavelength region around 13 nm,” J. Phys. IV France 104 251 (2003); http://dx.doi.org/10.1051/jp4:200300073
Comparison with other companies' productsWhy can only NTT-AT manufacture the EUV half mirror?
This is because NTT-AT has technologies with different roots: fine processing technology and multilayer deposition technology.
NTT-AT is also expanding its business as a world-leader in these technical fields.