X-ray chart
X-ray chart

The de facto standard of resolution evaluation charts for X-ray analysis.


NTT-AT's X-ray resolution evaluation charts are applied to several X-ray analysis situations which require ultra-high resolution, such as X-ray microscopes, X-ray micro-beam analysis, and X-ray imaging.  This de facto standard X-ray chart is used in a very large number of situations throughout the world.
High X-ray irradiation durability, ultra-sharp pattern, and low edge roughness. These are the biggest features of NTT-AT's X-ray chart. Our SiC membrane based Ta absorber chart has proved to be outstandingly accurate and provides clear images for your X-ray analysis system evaluation.
Please try out the proven performance as the de facto standard.


Three types of X-ray chart are available for various applications: standard type, high resolution and high contrast type, and ultra-high resolution type. Customization of the pattern layout and substrate dimensions is available for your system.


Item Standard type
High resolution type
with thicker Ta
Ultra high resolution
Substrate Material / Size Si 10mm square
Thickness 1mm 1mm 0.625mm
Membrane Material /
Ru 20nm
SiN 2µm
Ru 20nm
SiC 200nm
SiN 50nm
Ru 20nm
SiC 200nm
SiN 50nm
Area 1mm square 1mm square 1mm square
Alignment Center of the substrate Center of the substrate Center of the substrate
Pattern Absorber /
Ta 1µm Ta 500nm Ta 100nm
Minimum pattern
100nm 50nm 20nm
Radial Pattern
Patterned area 250µm × 350µm 300µm square 300µm square
Schematic of X-ray chart (High resolution chart)

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Ultra-high resolution type

XRESO-20 is the ultra-high resolution evaluation chart featuring minimum patern width of 20nm . This high specification model, released for sale in 2014, is applied to recent ultra-high resolution X-ray imaging system.
SEM image of chart Pattern layout
100nm hole X-ray_chart_14

①Radial Pattern
③④Hole Pattern
⑤⑥⑦⑧L&S Pattern
50nm L&S
20nm patterns 20nm Radial patterns
X-ray_chart_16 X-ray_chart_15

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Standard type

XRESO-100 provides a resolution of 100nm at low cost.  This high contrast standard chart has not only been applied to scientific fields but also to industry use, such as the calibration of X-ray inspection system.
Pattern layout

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High resolution type with thicker absorber

XRESO-50HC provides a high resolution of 50nm at a reasonable cost.  It has been applied to various applications such as X-ray micro beam irradiation, X-ray microscopes, and X-ray coherent imaging.
SEM image of chart Pattern layout
Radial patterns
Corresponding to point (1) of the pattern layout
50nm L&S
Corresponding to point (2) of the pattern layout

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Past record

NTT-AT's de facto standard X-ray resolution evaluation charts are utilized in worldwide enterprises, universities, and research institutes.

Paper lists

Satoshi Matsuyama, Yoji Emi, Hidetoshi Kino, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi, “Achromatic and high-resolution full-field X-ray microscopy based on total-reflection mirrors,” Opt. Express 23, 9746 (2015); http://dx.doi.org/10.1364/OE.23.009746
Shinji Ohsuka, Akira Ohba, Shinobu Onoda, Katsuhiro Nakamoto, Tomoyasu Nakano, Motosuke Miyoshi, Keita Soda and Takao Hamakubo, “Laboratory-size three-dimensional X-ray microscope with Wolter type I mirror optics and an electron-impact water window X-ray source ,” Rev. Sci. Instrum. 85, 093701 (2014); http://dx.doi.org/10.1063/1.4894468
A. Schropp, P. Boye, J. M. Feldkamp, R. Hoppe, J. Patommel, D. Samberg, S. Stephan, K. Giewekemeyer, R. N. Wilke, T. Salditt, J. Gulden, A. P. Mancuso, I. A. Vartanyants, E. Weckert, S. Schöder, M. Burghammer and C. G. Schroer, “Hard X-ray nanobeam characterization by coherent diffraction microscopy,” Appl. Phys. Lett. 96, 091102 (2010); http://dx.doi.org/10.1063/1.3332591
A. Schropp, R. Hoppe, J. Patommel, D. Samberg, F. Seiboth, S. Stephan, G. Wellenreuther, G. Falkenberg and C. G. Schroer, “Hard X-ray scanning microscopy with coherent radiation: Beyond the resolution of conventional X-ray microscopes,” Appl. Phys. Lett. 100, 253112 (2012); http://dx.doi.org/10.1063/1.4729942
P. Bruyndonckxa, A. Sasova and B. Pauwelsa, “Towards sub-100-nm X-ray microscopy for tomographic applications,” Powder Diffr. 25, 157 (2010); http://dx.doi.org/10.1154/1.3416936
S. P. Krüger, K. Giewekemeyer, S. Kalbfleisch, M. Bartels, H. Neubauer, and T. Salditt, “Sub-15 nm beam confinement by two crossed X-ray waveguides,” Opt. Express 18, 13492 (2010); http://dx.doi.org/10.1364/OE.18.013492
J. W. Jung, J. S. Lee, N. Kwon, S. J. Park, S. Chang, J. Kim, J. Pyo, Y. Kohmura, Y. Nishino, M. Yamamoto, T. Ishikawa and J. H. Je, “Fast microtomography using bright monochromatic X-rays,” Rev. Sci. Instrum. 83, 093704 (2012); http://dx.doi.org/10.1063/1.4751853
Sven Niese, Peter Krüger, Adam Kubec, Stefan Braun, Jens Patommel, Christian G. Schroer, Andreas Leson, and Ehrenfried Zschech, Full-field X-ray microscopy with crossed partial multilayer Laue lenses,” Opt. Express 22, 20008 (2014); http://dx.doi.org/10.1364/OE.22.020008
Mike Beckers, Tobias Senkbeil, Thomas Gorniak, Klaus Giewekemeyer, Tim Salditt and Axel Rosenhahn, “Drift correction in ptychographic diffractive imaging,” Ultramicroscopy 126, 44 (2013);  http://dx.doi.org/10.1016/j.ultramic.2012.11.006
Akihiro Suzuki, Shin Furutaku, Kei Shimomura, Kazuto Yamauchi, Yoshiki Kohmura, Tetsuya Ishikawa, and Yukio Takahashi, “High-Resolution Multislice X-Ray Ptychography of Extended Thick Objects,” Phys. Rev. Lett. 112, 053903 (2014); http://dx.doi.org/10.1103/PhysRevLett.112.053903
Yoshio Suzuki , “Interaction between periodic structures of object and X-ray standing wave generated by wavefront-division interferometer,” Rev. Sci. Instrum. 86, 043701 (2015); http://dx.doi.org/10.1063/1.4916735
Matthias Müller, Tobias Mey, Jürgen Niemeyer, and Klaus Mann, “Table-top soft X-ray microscope using laser-induced plasma from a pulsed gas jet,” Opt. Express 19, 23489 (2014); http://dx.doi.org/10.1364/OE.22.023489
F. Seiboth, M. Scholz, J. Patommel, R. Hoppe, F. Wittwer, J. Reinhardt, J. Seidel, M. Knaut, A. Jahn, K. Richter, J. W. Bartha, G. Falkenberg and C. G. Schroer, “Hard X-ray nanofocusing by refractive lenses of constant thickness,” Appl. Phys. Lett. 105, 131110 (2014); http://dx.doi.org/10.1063/1.4896914
R. N. Wilke, M. Vassholz and T. Salditt, “Semi-transparent central stop in high-resolution X-ray ptychography using Kirkpatrick–Baez focusing,” Acta Cryst. A 69, 490 (2013); http://dx.doi.org/10.1107/S0108767313019612
T. Salditt, S. Kalbfleisch, M. Osterhoff, S. P. Krüger, M. Bartels, K. Giewekemeyer, H. Neubauer, and M. Sprung, “Partially coherent nano-focused X-ray radiation characterized by Talbot interferometr,” Opt. Express 19, 9656 (2011); http://dx.doi.org/10.1364/OE.19.009656
K. Giewekemeyer, M. Beckers, T. Gorniak, M. Grunze, T. Salditt, and A. Rosenhahn. “Ptychographic coherent X-ray diffractive imaging in the water window,” Opt. Express 19 1037 (2011); http://dx.doi.org/10.1364/OE.19.001037
C. Homann, T. Hohage, J. Hagemann, A.-L. Robisch, and T. Salditt, “Validity of the empty-beam correction in near-field imaging,” Phys. Rev. A 91, 013821 (2015); http://dx.doi.org/10.1103/PhysRevA.91.013821
Klaus Giewekemeyer, Hugh T. Philipp, Robin N. Wilke, Andrew Aquila, Markus Osterhoff, Mark W. Tate, Katherine S. Shanks, Alexey V. Zozulya, Tim Salditt, Sol M. Grunerb, and Adrian P. Mancuso, “High-dynamic-range coherent diffractive imaging: ptychography using the mixed-mode pixel array detector,” J. Synchrotron Rad. 21 1167 (2014); http://dx.doi.org/10.1107/S1600577514013411
Max Rose, Petr Skopintsev, Dmitry Dzhigaev, Oleg Gorobtsov, Tobias Senkbeil, Andreas von Gundlach, Thomas Gorniak, Anatoly Shabalin, Jens Viefhaus, Axel Rosenhahne, and Ivan Vartanyants, “Water window ptychographic imaging with characterized coherent X-rays,” J. Synchrotron Rad. 22, 819 (2015); http://dx.doi.org/10.1107/S1600577515005524

Press release

NTT-AT's custom design X-ray test chart was introduced in a press release by Osaka University and Riken (published on March 4, 2013).

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