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Conical structure nano pattern array
(moth-eye structure for anti-reflection)

  • Si master mold or Ni electroformed mold
  • Patterns for surface improvement
  • Application as "functional film"
  • Anti-reflective structure independent from wavelength

Typical specifications

Substrate material Si, Ni electroformed mold, Glassy Carbon
Patterned area ~ 50mm
Pitch 200nm ~ 500nm
Depth 100nm ~ 1000um


Pattern examples

Si master mold

image1
Concave patter
image2
Convex pattern
image3
Pattern array (regular triangle array)
image4
High aspect ratio (depth : 300nm)

Ni electroforming mold

image5
Ni electroformed master
image6
Concave pattern


Application as anti-reflective structure

Reflectivity data :
Pitch : about 300um, Depth : about 400um

Si master mold
Si master mold
Plastic (PC) sample
Plastic (PC) sample


Random array

  • Patterns are randomly arrayed to reduce defraction

Si master mold pattern example

image7
× 50,000
image8
× 100,000



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