Etching
Etching services
- Both dry etching and wet etching available
- Dry etching with F-based gas and Halogen-based gas
- Wet etching with H
2SO4-based, HCl-based, HF-based etchant
Specifications
| Etching type | Available gas / chemicals | Available wafers / materials | Available sizes |
|---|---|---|---|
| Dry etching | F-based, halogen-based | III-V compounds, Si, insulating-film, quartz, sapphire, etc | 2, 3 inch phi, non-standard size wafer |
| Wet etching | H2SO4-based, HCl-based, HF-based | 2, 3, 4 inch phi, non-standard size wafer |
Advantages
- Evaluation after the etching is available
Depth evaluation: step measuring, cross-section SEM observation, AFM measurement
Profile/etching surface: cross-section SEM observation, surface SEM observation
- Metal etching is available
- Si deep groove available with dry etching
- Quartz deep groove available with dry etching
Examples
DRY Etching
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|---|---|
| Waveguide pattern on GaAs substrate (1) (height=2µm) |
Waveguide pattern on GaAs substrate (2) |
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|---|---|
| Curved waveguide pattern on InP substrate |
Deep-grooved pattern on Si substrate |
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| Pattern on quartz substrate (height=8µm) |
| Notes : | This content may be subject to change without notice. These stated pattern features and structures are representative and not guaranteed. Actual pattern features and structures are determined by the conditions and make-up of the samples and the required pattern structures, etc. |
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