"Total process" service
NTT-AT provides semiconductor device fabrication for R & D trial use.
- Various types of device fabrication by using our various processing techniques
- Optical device fabrication (e.g. LD), Electronic device fabrication (e.g. FET)
- Various types of device fabrication on InP, GaAs, Si, and LiNbO3 substrates
Example of Metalization process
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| Notes : | This content may be subject to change without notice. These stated pattern features and structures are representative and not guaranteed. Actual pattern features and structures are determined by the conditions and make-up of the samples and the required pattern structures, etc. |
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