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Scale for metrology (Standard type scale)

  • Suitable for calibration of length and angle of scanning probe essential for ultra fine pattern evaluation.
  • Reasonable price with short delivery

* "Custom-made" scale is available for ultra fine patterns with the pitch of 100nm or smaller.

Specifications

Type Vertical type
(AS100P-D)
Taperde type
(AS200P-A)
Application Length calibration, probe structure evaluation Angle calibration
Features
  • With anisotropic etching of Si(110) substrate, pattern structure is precisely vertical.
  • Able to measure precise probe structure thanks to good verticality
  • With anisotropic etching of Si(100) substrate, tapered angle of each pattern is precisely 54.7 degrees.
  • Suitable for confirmation of equipment reproducibility
Angle 90 degree 54.74 degree
Pattern type 1:1 L&S (Outside of the patterned area is concave)
4 different types :
400 nmL&S
400 nm Grid
200 nmL&S
100 nmL&S
Line width
(Convex area)
50 ~ 250 nm 100 ~ 400 nm
Pattern depth 125 nm±20% 100 ~ 200 nm (as is)
Patternde area 200µ × 200µ 180µ × 184µ × 4 (types)
Substrate Si 10mm × 10mm × 0.525mmt Si 10mm × 10mm × 0.525mmt

* Please note that the specifications may be subject to change without any prior notice.



Vertical type AS100P-D

SEM observation image
image
Cross section of 100nm pitch L&S


Taperde type AS200P-A

AFM observation image
(Unit : Horizontal direction : µm, Vertical direction : nm)
image1 image2
400nm pitch L&S pattern 800nm pitch grid pattern


Example of Custom-made scale
(e.x. vertical type with 50nm pitch)

TEM observation image
image
Cross section of 50nm pitch L&S



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