X-ray chart (resolution chart)
- Ta absorber patterns (highly precise fine patterns with good processability of Ta)
- SiN or SiC membrane
- Three different types according to your needs
Specifications
| Item | New ! Standard type ATN/XRESO-100 |
High resolution type ATN/XRESO-50 |
High resolution type with thicker Ta absorber ATN/XRESO-50HC |
|
|---|---|---|---|---|
| Substrate | Material / Size | Si 10mm square | Si 10mm square | Si 10mm square |
| Thickness | 10mm | 1mm | ||
| Membrane | Material / Thickness |
Ru 20nm SiN 200µm |
Ru 20nm SiN 200nm |
Ru 20nm SiC 200nm SiN 50nm |
| Area | 1mm square | 1mm square | ||
| Alignment | Center of the substrate | Center of the substrate | ||
| Pattern | Absorber / Thickness |
Ta 1µm | Ta 200nm | Ta 500nm |
| Minimum pattern size |
100nm | 50nm | 50nm | |
| Patterned ares | 250µm × 350µm | 300µm square | 300µm square | |

Schematic of X-ray chart (High resolution chart)
Standard type
ATN / XRESO-100 New !
| Pattern layout |
|---|
![]() |
High resolution type
ATN/XRESO-50
| SEM image of chart | |
|---|---|
| 100nm hole Corresponding to point (1) of the pattern layout |
50nm L&S Corresponding to point (2) of the pattern layout |
![]() |
![]() |
| Radial patterns Corresponding to point (3) of the pattern layout |
Radial patterns 50nm area Corresponding to point (3) of the pattern layout |
![]() |
![]() |
| Image with X-ray inspection equipment (TUX-5000F) form Tohken Corporation. ↓↓↓ |
Pattern layout |
![]() Courtesy of Tohken Corporation | ![]() |
High resolution type with thicker absorber
ATN/XRESO-50HC
| SEM image of chart | Pattern layout |
|---|---|
| Radial patterns Corresponding to point (1) of the pattern layout |
![]() |
![]() |
|
| 50nm L&S Corresponding to point (2) of the pattern layout |
|
![]() |
* Please note that the specifications may be subject to change without any prior notice.










