Custom designable XUV, EUV, and X-ray mirrors, only NTT-AT in the world
NTT-AT has been supplying high-quality XUV, EUV, and X-ray mirrors for more than 20 years. In particular, backed by its extensive experience and outstanding skills, it provides custom-designable multi-layer film mirrors adapted to meet individual customer requirements.
Research institutes around the world have continued to choose NTT-AT's multi-layer mirrors because of their quality. Multi-layer materials and structure are customized to meet your detailed specifications, such as substrate, peak wavelength, bandwidth, and dispersion. High heat-durability multi-layer mirrors are also supported. A reflectivity evaluation service using synchrotron facilities is also available as an option.
|XUV (EUV) mirror||
High-order harmonics applications
50 eV ~100 eV
50 eV~100 eV
50 eV ~ 70 eV
25 eV ~50 eV
|Single layer mirror||
|10 eV ~ 100 eV|
Built into X-ray non-destructive
|1 keV ~ 30 keV|
|Single layer mirror||
|1 keV ~ 30 keV|
XUV multi-layer mirrors（EUV multi-layer mirrors）Substrate shape: plane, convex, concave, paraboloid, Toroidal surface, ellipsoid
Substrate materials: Quartz, silicon, zero dewer, etc.
multi-layer film materials:：Mo/Si, Ru/Si, Zr/Al, SiC/Mg, Cr/C etc.
Substrate size ：φ3 mm～φ300 mm
NTT-AT will provide high-durability XUV multi-layer mirrors, highly heat-resistant XUV multi-layer film mirrors as well as optical systems, such as Schwarzschild optical systems and pump probe optical systems.
|Φ10mm plane mirror||
Measured reflectivities of Mo/Si multi-layers
(normal incident angle: 2 degrees)
|Multi-layer mirror for pump probe test||
Measured relectivities of broadband mirrors, narrow band mirror(wavelength :30 nm)
Mo/Si multi-layer mirrors have a high reflectivity near the wavelength of 13 nm (90 eV). NTT-AT’s Mo/Si multi-layer mirrors have a reflectivity of up to 70% for normal incidence.
The materials, film structure, and substrate shape of NTT-AT’s XUV mirrors can be customized to suit your needs regarding central wavelength and optical arrangements.
EUV broadband ellipsoidal mirror
(Φ100 mm zero dewer)
Ｘ-ray multi-layer mirrorsSubstrate figure: plane, ellipsoid, paraboloid, cylindrical surface, toroidal surface
Substrate: Quartz, Silicon, zero dewer, etc.
Substrate materials: W/B4C, W/C, Pt/C etc.
Substrate size: Max 500 mm
NTT-AT provides K-B mirror system, Walter mirror etc.
|W/B4C multi-layer and W/C multi-layer film mirrors have high reflectivity for hard X-ray applications. To reflect and concentrate a hard X-ray efficiently, it is necessary to minimize the oblique angle of incidence. This requires a long mirror length and a small multi-layer film cycle length.|
|Multi-layer mirror for K-B mirror system|
|The materials, film structure, and substrate shape of NTT-AT’s X-ray mirrors can be customized to suit your needs regarding central wavelength, bandwidth and optical arrangements.|
|Evaluated reflectivity (wavelength: 0.154 nm, Blue: measured reflectivity, Pink: calculated reflectivity, periodic length: 2.95 nm)|
Single layer mirrorsSubstrate figure: plane ,ellipsoid ,Paraboloid ,cylindrical surface ,toroidal surface
Substrate materials: Quartz, Silicon, zero dewer, etc.
Multi-layer materials: C, B4C, SiC, Ru, NbN, Pt, etc.
Substrate size: Max 500 mm
NTT-AT provides K-B mirror system, Walter mirror, etc.
Single layer mirrors, which use total reflection, are used for beam steering, light concentration and removal of unneeded wavelengths in the XUV to X-ray range.
The materials and substrate shape of NTT-AT’s single layer mirrors can be customized to suit your needs regarding central wavelength and optical arrangements.
|Ellipsoidal mirror with Ru layer|
We have supported many experiments and studies for synchrotron radiation applications, XFEL applications, high-order harmonics applications including attosecond science and material science, soft-X-ray laser applications, and astronomy. NTT-AT's XUV multi-layer mirrors with unparalleled quality are valued by the academic community.
NTT-AT provides low-cost, short lead-time, and stable-quality multi-layer mirrors for industrial applications of EUV light including EUV lithography. We are ideally positioned to support your practical use of EUVL light source developments, EUV resist developments, EUV mask inspections, and other peripheral areas as your R&D partner.
- Hiroki Mashiko, Akira Suda, and Katsumi Midorikawa, “Focusing coherent soft-X-ray radiation to a micrometer spot size with an intensity of 1014 W/cm2,” Opt. Lett. 29. 1927 (2004); http://dx.doi.org/10.1364/OL.29.001927
- K. Ichiyanagi, T. Sato, S. Nozawa, K. H. Kim, J. H. Lee, J. Choi, A. Tomita, H. Ichikawa, S. Adachi, H. Ihee and S. Koshihara, “100?ps time-resolved solution scattering utilizing a wide-bandwidth X-ray beam from multilayer optics,” J. Synchrotron Rad. 16, 391 (2009); http://dx.doi.org/10.1107/S0909049509005986
- Kyung Hwan Kim, Jong Goo Kim, Shunsuke Nozawa, Tokushi Sato, Key Young Oang, Tae Wu Kim, Hosung Ki, Junbeom Jo, Sungjun Park, Changyong Song, Takahiro Sato, Kanade Ogawa, Tadashi Togashi, Kensuke Tono, Makina Yabashi Tetsuya Ishikawa, Joonghan Kim, Ryong Ryoo, Jeongho Kim, Hyotcherl Ihee and Shin-ichi Adachi, “Direct observation of bond formation in solution with femtosecond X-ray scattering,” Nature 518, 385 (2015); http://dx.doi.org/10.1038/nature14163
- Kil-Byoung Chai and Paul M. Bellan, “Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection,” Rev. Sci. Instrum. 84, 123504 (2013); http://dx.doi.org/10.1063/1.4841915
- Hiroki Mashiko, Tomohiko Yamaguchi, Katsuya Oguri, Akira Suda and Hideki Gotoh, “Characterizing inner-shell with spectral phase interferometry for direct electric-field reconstruction,” Nature Communications 5, 5599 (2014); http://dx.doi.org/10.1038/ncomms6599
- Hiroki Mashiko, Steve Gilbertson, Michael Chini, Ximao Feng, Chenxia Yun, He Wang, Sabih D. Khan, Shouyuan Chen and Zenghu Chang, “Extreme ultraviolet supercontinua supporting pulse durations of less than one atomic unit of time,” Opt. Lett. 34, 3337 (2009); http://dx.doi.org/10.1364/OL.34.003337
- Mizuho Fushitani, Akitaka Matsuda, Akiyoshi Hishikawa, “EUV and soft X-ray photoelectron spectroscopy of isolated atoms and molecules using single-order laser high-harmonics at 42 eV and 91 eV,” J. Electron Spectrosc. Relat. Phenom. 184, 561 (2012); http://dx.doi.org/10.1016/j.elspec.2011.10.002
Publication list (including co-authored papers):
- Satoshi Ichimaru, Masatoshi Hatayama, Tadayuki Ohchi and Satoshi Oku, “Mo/Si multilayer mirrors with 300-bilayers for EUV lithography,” Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 965814 (2015); http://dx.doi.org/10.1117/12.2197314
- Hisataka Takenaka, Satoshi Ichimaru, Koumei Nagai, Tadayuki Ohchi, Hisashi Ito and E. M. Gullikson, “Multilayer mirrors for µ-XPS using a Schwarzschild objective,” Surf. Interface Anal.37, 181 (2005); http://dx.doi.org/10.1002/sia.1959
- Ichiro Yoshikawa, Tetsunori Murachi, Hisataka Takenaka and Satoshi Ichimaru, “Multilayer coating for 30.4nm,” Rev. Sci. Instrum. 76, 066109 (2005); http://dx.doi.org/10.1063/1.1938867
- M. Hatayama, H. Takenaka, E. M. Gullikson, A. Suda and K. Midorikawa, “Broadband extreme ultraviolet multilayer mirror for supercontinuum light at a photon energy of 35-65 eV,” Appl. Opt. 48, 5464-5466 (2009); http://dx.doi.org/10.1364/AO.48.005464
Comparison with other companies’ products
EUV mirrors are manufactured and sold by only a few companies globally. If you are not satisfied with your current provider, NTT-AT can fabricate custom-designed mirrors that will satisfy your most demanding requirements. NTT-AT will propose an optimized design that precisely reflects your specifications.