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Length measuring scale

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  • Ideal for length and angle calibration of scanning probe microscopes, etc. essential for fine pattern evaluation
  • Low price and short delivery time

* We also accept special orders for ultra-fine patterns with a pitch of 100 nm or less.

Features/Specifications

  Vertical type (AS100P-D) Inclined type (AS200P-A)
Usage Length calibration, probe shape evaluation angle calibration
Feature
  • Since anisotropic etching is used on a Si (110) substrate, the pattern shape is vertical and accurate.
  • Accurate probe shape measurement is possible due to high degree of orthogonality
  • Since anisotropic etching is used on a Si (100) substrate, the pattern tilt angle is accurate at 54.7 degrees.
  • Accurate tilt angle of 54.7 degrees, ideal for equipment reproducibility confirmation
angle of inclination 90 degree 54.74 degrees
Pattern type 1:1 L&S (concave outside the pattern area) 400 nm L&S
400 nm grid
200 nm L&S
100 nmL&S or more 4 types
Line (convex) width 50-250nm 100-400 nm
pattern depth 125nm±20% 100-200 nm (off-the-shelf)
pattern area 200μm×200μm 184μm×184μm×4 (seed)
substrate Si 10mm×10mm×0.525mmt Si 10mm×10mm×0.525mmt

*We offer low prices and short delivery times. Please feel free to contact us.

Vertical type (AS100P-D)

100nm pitch L&S cross section
100nm pitch L&S cross section

Inclined type (AS200P-A)

AFM observation image(unit: horizontal direction: μm, vertical direction: nm)

400nm pitch L&S pattern
400nm pitch L&S pattern
800nm pitch grid pattern
800nm pitch grid pattern

Custom order example

TEM image

50nm pitch L&S cross section
50nm pitch L&S cross section

 

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