Design and fabrication of EUV/X-ray focusing systems

A wide variety of EUV (extreme ultraviolet light) and X-ray optics systems according to your operating needs


ellipsoid of revolution condenser mirror	Schwarzschil condenser mirror

Benefits / Features

Design and manufacture of a variety of light condensing systems and optical systems
Schwarzschild light collection optical system, K-B mirrors, ellipsoidal mirrors, parabolic mirrors, optical systems for high-order harmonics, etc.
The following X-ray optical parts can be used:
- Condenser and reflection mirror: EUV and soft X-ray mirror / hard X-ray mirror, Fresnel Zone Plate (FZP), soft X-ray beam splitter
- Spectrum element: reflective type diffraction grating / transmission type diffraction grating, X-ray / EUV filter
- Beam shaping element: pinhole, split, central beam stop
- Beam evaluation element: X-ray chart, scale for microbeam width measurement
A variety of items necessary for experiments such as stage chambers, programs for control and measurement, etc.
Experimental system setup and optical adjustments for systems we have made are available.
The design, manufacture and customized development of all kinds of experiment systems and experimental parts.

The Schwartzschild mirrors for image optics systems such as optical systems, microscopes, telescopes, etc. that focus EUV (extreme ultraviolet light) and soft X-rays that are produced by Laser Produced Plasma (LPP), Synchrotron Radiation (SR light), etc.
EUV / soft X-ray multilayer film coating to the concave-convex surface of the mirror will be applied to match the wavelength.
Able to design and manufacture optical systems such as microscopes, analysis equipment, etc. that use Schwartzschild Optical Systems.


Diagram of soft x-ray microscopy photoelectron system	Concave and convex mirror for Schwarzschild optics (Mo/Si multilayer coating)

Lens tube and adjusting mechanism for Schwarzschild	Mirror unit for telescope (back) Mirror unit for microscope (front)

This system is used to focus the EUIV light, soft X-rays and hard X-rays generated from synchrotron radiation and laser plasma X-ray sources.
Able to design and manufacture K-B mirror focusing systems.
Able to apply the X-ray multilayer film coating to the substrate for K-B mirrors.


K-B mirror condenser system diagram	Concave mirror for K-Bmirror condenser system

K-B mirror system with adjusting mechanism	Example of installation of K-B mirror system for measuring system

Design and manufacture optical systems and optical elements that are optimally suited for high order harmonics needed for applications such as pump-probe measurement, cross-correlation measurement, high order harmonic autocorrelation measurement, etc. that make use of laser fundamental harmonics and high order harmonic generation.
Optical elements such as X-ray / EUV filters, transmission gratings, EUV mirrors, etc., for high order harmonics optical systems will be used.

High order harmonic pulse width measuring system which has cross-correlation with laser fundamental wave

This as an extremely flat filter which smoothly spatially divides light which has become mixed with laser light and EUV light into clearly laser light and EUV light.
The photograph below shows a type in which the EUV light penetrates at the center and the laser light penetrates in the surrounding area.
Able to design and manufacture specially shaped filter holders.


Space division type filter (Center: EUV light transmission, Surrounding part: Laser light transmission)	Diagram of space division type filter

Special shape filter holder^1 1: Standard type EUV filter is assembled

A mirror that reflects EUV light in the center and laser light in the perimeter.
Using a drive mechanism to make a different optical path from the mirror perimeter and the mirror center, it is possible to create a temporal delay between the laser beam and the EUV light.


Double mirror for condenser system (Center: Mo/Si multilayer coating for EUV condenser, Surrounding part: Ag layer coating for laser light condenser)

Double mirror diagram for condenser	Double mirror holder for condenser and mirror drive mechanism


Pin hole and holding stage	Simplified type mirror stage / pin hole stage mount unit

Laser plasma X-ray source chamber	Fluorescence X-ray analysis chamber