CS ManTech

This year at CS ManTech (The International Conference on Compound Semiconductor Manufacturing Technology) NTT-AT will showcase the GaN Epitaxial Wafer, etc.
We look forward to seeing you in CS ManTech.
Please stop by our booth.

About CS ManTech

Date	May 19-22, 2014
Location	Sheraton Denver Downtown Hotel, Denver, Colorado, USA
Organizar	Compound Semiconductor Mantech
Website	http://www.gaasmantech.org/index.html
Admission	Free (Limited to those who participate in international conference)

Details

article on exhibition	GaN Epitaxial Wafer Power devices using GaN are expected to be the "green" devices that will support the low carbon society of the future. Through its GaN epitaxial wafer technology, NTT-AT is helping to bring an early realization of an energy saving generation. Compact Supercritical Dryer A pattern collapses when liquid surrounding the pattern in various fabrication processes dries up. Supercritical drying can prevent this kind pattern collapse. Pressure Controllable Automatic Oven PCOA-01T A pressure- and- heat- process is started by only pushing a start button after setting samples on a chamber stage. Rapid heating-up and cooling-down characteristics achieve quick turnaround time (QTAT).

article on exhibition

GaN Epitaxial Wafer
Power devices using GaN are expected to be the "green" devices that will support the low carbon society of the future.
Through its GaN epitaxial wafer technology, NTT-AT is helping to bring an early realization of an energy saving generation.
Compact Supercritical Dryer
A pattern collapses when liquid surrounding the pattern in various fabrication processes dries up.
Supercritical drying can prevent this kind pattern collapse.
Pressure Controllable Automatic Oven PCOA-01T
A pressure- and- heat- process is started by only pushing a start button after setting samples on a chamber stage.
Rapid heating-up and cooling-down characteristics achieve quick turnaround time (QTAT).